Gates of Plasma

Gates of Plasma

Gates of Plasma

"If you've got a grievance with reality, I reckon you're in the right place."A semi-truck driver meets a mysterious woman while participating in a research study for a pharmaceutical corporation. Romance blooms, but they are separated when it is discovered that this woman emits an unknown substance from her ear that is of great interest to the CEO of the drug company.

Lecture Notes on Principles of Plasma Processing

Lecture Notes on Principles of Plasma Processing

Lecture Notes on Principles of Plasma Processing

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Principles of Plasma Discharges and Materials Processing

Principles of Plasma Discharges and Materials Processing

Principles of Plasma Discharges and Materials Processing

A Thorough Update of the Industry Classic on Principles of PlasmaProcessing The first edition of Principles of Plasma Discharges and MaterialsProcessing, published over a decade ago, was lauded for itscomplete treatment of both basic plasma physics and industrialplasma processing, quickly becoming the primary reference forstudents and professionals. The Second Edition has been carefully updated and revised toreflect recent developments in the field and to further clarify thepresentation of basic principles. Along with in-depth coverage ofthe fundamentals of plasma physics and chemistry, the authors applybasic theory to plasma discharges, including calculations of plasmaparameters and the scaling of plasma parameters with controlparameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory ofdischarges, graduate students and researchers in the field ofplasma processing should find this new edition more valuable thanever.

High Density Plasma Sources

High Density Plasma Sources

High Density Plasma Sources

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.